• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    An object of the present invention is to achieve the target, the clamping and the shielding of the isolated area on the end block so as to obtain long treatment times with maximum working electrical powers and without influence on the use. of the target material. Therefore, there is provided a magnetron system which includes an end block which has a target attachment device for the rotational coupling of a tbular shaped target, a retainer for a magnet system. disposed within the tubular-shaped target and an armor that covers the end of a tubular-shaped target mounted in the target fixation device, the area of the armor covering the end of the tubular-shaped target being configured in such a way that the annular slot remaining between the tubular-shaped target and the armor has at least, seen from the outside, a part leading radially outwards.
    公开号:BE1018645A5
    申请号:E2008/0532
    申请日:2008-09-24
    公开日:2011-06-07
    发明作者:Hans-Juergen Heinrich；Thorsten Sander；Goetz Grosser；Ulf Seyfert
    申请人:Ardenne Anlagentech Gmbh；
    IPC主号:
    专利说明:

    The invention relates to a magnetron system with a magnetron end block with a shielded target fixing device. Rotatable tubular target magnetrons usually consist of the following main components: target tube (or tubular target), end block, and magnet system. The target tube is connected to the front side, for example by means of a target clamping device, on each side to a magnetron end block. In this target clamping device or other target attachment device, the tubular shaped target which comprises a carrier tube with target material applied to the envelope surface by plasma spraying, bonding or fusion metallurgy is mounted to rotation. But the tubular target can also be in one piece; in this case, the carrier tube is part of the target material. Inside the tubular shaped target is a magnetron system attached to a support provided for this purpose or to another retaining device which produces the magnetic field necessary for focusing the plasma.
    For optimum use of the target material, the magnetic field is brought into proximity with the target attachment device on the front sides of the target tube, for example a target clamp. Such a target clamping device may comprise, for example, a support flange 21, a clamping ring 22 and a tension ring 23. Because the target and the end block bodies have a different electrical potential, both are functionally isolated from each other. The end-block body is suitably wrapped with an anti-clothing shield which can not, however, touch the current-conducting target. To protect the target attachment device and the end block bodies from unwanted coating and parasitic plasmas, the junction of the target tube with the end block body is protected in the region of the fastener target by means of a shield, another device called anti-coating protection. This shield prevents diffuse steam from bypassing the insulation between the target fixture and the shield and between the target fixture and the end block body.
    The shielding is generally carried out in such a way that an annular slot between the target attachment device or the target material and the shield prevents the penetration of diffuse vapor.
    Document US Pat. No. 5,213,672 discloses a shielding which is formed as a hollow cylinder and which surrounds an end of the tubular target such that an annular slot remains between the shield and the tubular target, an additional hollow cylindrical insulator being disposed within the annular slot.
    To avoid an arc discharge which may occur above the outer side of such a hollow cylindrical shield, it is proposed in US 5,527,439 to provide on the outer side of the shield an annular structure, for example for example a circumferential groove.
    Other hollow cylindrical shields are known from US 5,725,746 in which embodiments are also proposed in which the shield extends around an end portion of the tubular target which tapers in front of the zone. 5) or in which the outside diameter of the tubular target has an enlarged outside diameter directly in front of the shielding in front of the spray zone (Fig. 6) so that the first part (from the point of view of diffuse vapor particles) of the slit remaining between the tubular target and the shield extends radially towards the axis of rotation and the axis of symmetry of the tubular target.
    In US 2005/0051422, hollow cylindrical shields are again proposed which do not however extend beyond the fastening device on the side of the end block.
    The disadvantage of the achievements made so far is that the configuration of the target attachment device and the shield can not be optimally performed to do justice to their function due to the heat load due to the plasma up to the peripheral region of the tubular target, the result is an annular slot whose sealing is not sufficient to counter the penetration of diffuse vapor. This annular slot is also a simple hollow cylindrical shape, that is to say that diffuse vapor can penetrate through the annular slot in the axial direction inside the shield. In this regard, providing a shield with a first portion of the slot extending radially between the shield and the tubular target, as described above, is equally disadvantageous.
    An object of the present invention is to configure the target, the clamping and the shielding of the insulated area on the end block so as to obtain long working times with maximum power of work and without influence on the use of the target material.
    The various elements of the invention can be described by the fact that, with respect to the known solutions, the disturbing influences are physically more distant from each other and / or that the two end blocks are positioned apart from each other. of the other to such an extent that the plasma which is formed has no thermally increased influence on the shielding and / or that the tubular target carrier tube and the target material applied thereto are of a diameter greatly decreased on the frontal side and / or that the shield is conically shaped with respect to the target material and a narrow and sinuous annular slot is formed.
    One possible measure to solve the existing problem is not to fill the end of the target tube with target material, that is to say to enlarge the distance between the target attachment device or the shielding covering the target. target attachment device and target material disposed on the target tube. Alternatively, the target material can be made with a reduced diameter in the end regions of the target tube such that the spray acts essentially on the region of the largest diameter target material but at the same time the sputtering unwanted material of the target tube is prevented.
    Another possible measure is to configure the tubular target such that there is a clear difference between the outside diameter of the target tube and the outside diameter of the target material applied to the target tube and the inside diameter of the target tube the visible opening of the shield surrounding the target tube is chosen such that this opening surrounds as closely as possible the target tube which is not lined at its ends with target material. In the case of a target material which is produced, as described above, with a reduced diameter in the end regions of the target tube, this corresponds to a realization with a clear difference between the outside diameter of the target material in the zones. and the outer diameter of the target material in the sputtering zone, the inside diameter of the shield opening being selected such that this opening surrounds as closely as possible the target material in these end zones.
    Diffuse vapor penetration within the shield can be significantly reduced or prevented because the annular gap between the target attachment device and the end of the tubular target on the one hand and the shield of On the other hand, it is no longer simply rectilinear like a hollow cylinder but is instead configured in a sinuous fashion or as a labyrinth seal, i.e. with at least one axially extending portion and at least one portion extending radially.
    That is why there is provided a magnetron system which includes an end block which has a target attachment device for rotationally coupling a tubular shaped target, a retainer for a magnet system disposed within the tubular-shaped target and a shield that covers the end of a tubular-shaped target mounted in the target attachment device, the shielding area overlying the end of the tubular-shaped target being configured in such a way that the annular gap remaining between the tubular target and the shield has at least, from the outside, a radially outwardly directed portion, that is, radially directed from the axis tube outwardly and a portion leading radially inwardly.
    "Outside view" in this case means a view that corresponds to the view of the annular slot from the position of a diffuse vapor particle that reaches the annular slot. When, for example, at a first portion of the annular slot extending axially with respect to the target tube a second portion is conducted radially outward, the subsequent movement of the diffuse vapor particle is rendered substantially difficult by the annular slot, since this direction of movement is directed in the opposite direction to the original direction of motion of the diffuse vapor particle prior to entry into the annular slot. The delineation of the annular gap formed by the outer surface of the target carrier tube or target material or target attachment device and the inner surface of the shielding subtracts energy from the incoming water vapor particles so that that they can not penetrate further into the annular gap. Through part of the annular slot leading radially outwards, it is not only necessary to hear parts directed perpendicular to the axis of rotation of the target but also those parts which extend obliquely with respect to the axis of rotation, since these parts slow down and ultimately prevent the movement of the diffuse vapor particles through the annular slot. It is envisaged that the annular gap remaining between the tubular target and the shielding further has at least, seen from the outside, a portion leading radially inward, that is to say directed radially from the outside towards the axis of rotation. Thanks to the renewed inversion of the direction of movement of the particles, additional energy is subtracted from the diffuse vapor particles which have been able to exceed the portion of the annular slot leading radially outwards due to a greater kinetic energy.
    The proposed characteristics of the shield and the resulting annular slot can be obtained in terms of construction, for example, because the outer diameter of the target attachment device is larger than the inside diameter of the opening of the surrounding shield. the target tube or the target material. In this way, the shield applies, seen from the end block, as claws on the target fixture. Therefore, it may be useful to carry out the two-part shield with an axially extending separation plane so that shield assembly and disassembly can be simplified compared to a one-piece construction.
    It may further be provided that the outer diameter of the target material is greater than the inside diameter of the shield opening surrounding the target material disposed in the end zone of the tubular shaped target. Thanks to this measurement, the removal process during the spraying takes place at a radial distance from the annular gap so that, as a result, the probability that a diffuse vapor particle reaches the entry zone of the annular gap is reduced. In addition, the tubular target may be configured such that the end regions of the target tube are free of target material so that the spray area also has a distance from the shield in the axial direction. In this case, it may further be useful to realize the shorter magnet system within the tubular target so that the plasma burns only above the target material and the ends of the target tube. are not exposed to the action of the spray.
    With a corresponding configuration in terms of construction comprising several parts which lead alternately radially inwards and outwards and which are connected to each other, where appropriate, by axial parts, it is possible to obtain that the outer surfaces of the target fixing device and the end of the tubular shaped target mounted therein on the one hand and the inner surface of the shielding on the other hand are spaced apart from each other by a sinuous annular slot.
    This annular slot may advantageously have a slot dimension so small as to form a labyrinth seal which reliably prevents the penetration of diffuse vapor particles so that no diffused vapor reaches the block. end.
    In another embodiment, it may be provided that the outer side of the shielding region on the end of the tubular shaped target is conically formed.
    The proposed magnetron system will be explained in more detail below on the basis of an exemplary embodiment and a drawing relating thereto. The special one
    Fig. 1 shows a longitudinal section through an end block and the end zone of the tubular target attached thereto.
    The end block 1 comprises in a known manner a housing which is configured for vacuum tight connection to a chamber wall of a vacuum coating plant. The end block 1 serves for rotatably mounting the tubular target 3 which comprises a target tube 31 as well as the target material 32 disposed on the envelope surface of the target tube 31, as well as the mounting the magnet system 5 inside the target tube 31.
    The end block 1 further comprises a hollow shaft rotatably mounted with a support flange 21 which, in this embodiment, forms together with a clamping ring 22 loosely attached to the target tube 31 and with a tension ring 23 covering and connecting the support flange 21 and the clamping ring 22 a target attachment device 2.¾ The magnet system 5 is fixed to the retainer 4 which is guided through the hollow shaft of the target attachment device 2 so that the magnet system 5 can remain at rest when the tubular target 3 rotates.
    On the end block 1 is also fixed a shield 6 which covers as claws the target fixing device 2 and the end of the tubular target 3. The outer side 61 of the shielding zone 6 which covers the end of the tubular target 3 is made conically. The outer diameter of the target attachment device 2 is larger than the inside diameter of the opening 7 of the shield 6 surrounding the target tube 31 and the outer diameter of the target material 32 is larger than the inner diameter of the opening 7 of the shield 6 surrounding the target tube 31. In addition, the target material 32 and the magnet system 5 are made such that the spray zone has a clear axial distance from the end of the tube target holder 31 and with respect to the end block 1.
    The annular slot remaining between the shield 6 and the target tube 31 or the target fixing device 2 has, seen from the outside, in this order, a first axial portion, a second portion leading radially outwardly. , a third axial portion and a fourth portion leading radially inwardly. This embodiment is comparatively simple to implement, but it would of course also be possible to provide other parts to finally achieve a sinuous configuration of the annular slot 71.
    Numerical reference list 1 End block 2 Target fixation device 21 Support flange 22 Clamp ring 23 Tension ring 3 î Tubular target 31 Target pipe 32 Target material 4 Retainer 5 Magnet system 6 Shield 61 Outside 7 Opening 71 Ring Slot
    权利要求:
    Claims (6)
    [1]
    A magnetron system, comprising an end block (1) with a target attachment device (2) for rotationally coupling a tubular shaped target (3), a retaining device (4) for a magnet system (5) disposed within the tubular shaped target (3) and a shield (6) which covers the end of a tubular shaped target (3) mounted in the target (2), the region of the shield (6) covering the end of the tubular target (3) being configured such that the annular gap (71) remains between the tubular target (3) and the shield (6) has at least, seen from the outside, a radially outwardly extending portion and a radially inwardly extending portion.
    [2]
    Magnetron system according to Claim 1 or 2, characterized in that the outside diameter of the target fixing device (2) is greater than the inside diameter of the opening (7) of the shield (6) surrounding the target. of tubular form (3).
    [3]
    Magnetron system according to one of the preceding claims, characterized in that the outer diameter of the target material (32) is larger than the inside diameter of the opening (7) of the shield (6) surrounding the target of tubular form (3).
    [4]
    Magnetron system according to one of the preceding claims, characterized in that the outer surfaces of the target fixing device (2) and the end of the tubular-shaped target (3) mounted therein on the one hand and the inner surface of the shield (6) on the other hand are spaced from each other by a sinuous annular slot (71).
    [5]
    Magnetron system according to one of the preceding claims, characterized in that the annular slot (71) forms a labyrinth seal.
    [6]
    Magnetron system according to one of the preceding claims, characterized in that the outer side of the region of the shield (6) covering the end of the tubular target (3) is conically formed.
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    同族专利:
    公开号 | 公开日
    DE102008048785A1|2009-04-09|
    US20090078572A1|2009-03-26|
    DE102008048785B4|2014-04-17|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US5470452A|1990-08-10|1995-11-28|Viratec Thin Films, Inc.|Shielding for arc suppression in rotating magnetron sputtering systems|
    US5100527A|1990-10-18|1992-03-31|Viratec Thin Films, Inc.|Rotating magnetron incorporating a removable cathode|
    US5108574A|1991-01-29|1992-04-28|The Boc Group, Inc.|Cylindrical magnetron shield structure|
    DE4117518C2|1991-05-29|2000-06-21|Leybold Ag|Device for sputtering with a moving, in particular rotating, target|
    US5567289A|1993-12-30|1996-10-22|Viratec Thin Films, Inc.|Rotating floating magnetron dark-space shield and cone end|
    US5527439A|1995-01-23|1996-06-18|The Boc Group, Inc.|Cylindrical magnetron shield structure|
    CH691686A5|1995-11-16|2001-09-14|Unaxis Balzers Ag|Vacuum treatment chamber.|
    US20050051422A1|2003-02-21|2005-03-10|Rietzel James G.|Cylindrical magnetron with self cleaning target|
    CN1761832A|2003-03-25|2006-04-19|贝克特先进涂层公司|Universal vacuum coupling for cylindrical target|
    US20060278519A1|2005-06-10|2006-12-14|Leszek Malaszewski|Adaptable fixation for cylindrical magnetrons|DE102010031205A1|2010-07-09|2012-01-12|Von Ardenne Anlagentechnik Gmbh|Magnetron device, has magnet system arranged inside pipe target and extended with coating material, where outer side of coating material-free end region of support tube is made from reduced sputteringability material|
    DE102010040267B4|2010-09-03|2014-07-17|Von Ardenne Anlagentechnik Gmbh|Sputtering device with tubular target|
    DE102010043114B4|2010-10-29|2015-02-12|Von Ardenne Gmbh|Magnetron device with tube target|
    DE202015101514U1|2015-03-25|2015-04-21|Von Ardenne Gmbh|Magnetron device with tube target|
    法律状态:
    2019-06-12| MM| Lapsed because of non-payment of the annual fee|Effective date: 20180930 |
    优先权:
    申请号 | 申请日 | 专利标题
    DE102007045714|2007-09-24|
    DE102007045714|2007-09-24|
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